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DS: Fachverband Dünne Schichten
DS 8: Layer Deposition I: Inorganic Thin Films
DS 8.1: Vortrag
Montag, 16. März 2020, 15:00–15:15, CHE 89
High quality vanadium dioxide thin films grown by a simple and low cost spray pyrolysis technique — •Oisín Murtagh1, David Caffrey1, Karsten Fleischer2, Daragh Mullarkey1, and Igor Shvets1 — 1School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College, University of Dublin, Dublin 2, Ireland — 2School of Physical Sciences, Dublin City University, Dublin 9, Ireland
Vanadium dioxide is a well-known electronic phase change material due to strong electron correlation. In this presentation the details of VO2 thin film growth on Al2O3(0001) substrates using a low temperature solution based method (spray pyrolysis) and a subsequent annealing step in an inert atmosphere are described. The dependence of the growth on solvent, precursor, growth temperature and annealing conditions are examined. The resulting films show high crystallinity, homogeneity and a metal-insulator transition (MIT) at 70∘C accompanied by a resistivity change of over 4 orders of magnitude. Structural, morphological, chemical and electronic properties are characterised using XRD, XPS, profilometry, AFM and 4 point probe electrical measurements. Triggering of the MIT through the application of an electric-field is also shown using microlithographic channels. The simplicity, scalability and cost of this growth method make it a promising candidate for large scale implementation of VO2 in modern applications, with an emphasis on non-conventional computing electronics.