Dresden 2020 –
wissenschaftliches Programm
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DS 8: Layer Deposition I: Inorganic Thin Films
Montag, 16. März 2020, 15:00–16:30, CHE 89
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15:00 |
DS 8.1 |
High quality vanadium dioxide thin films grown by a simple and low cost spray pyrolysis technique — •Oisín Murtagh, David Caffrey, Karsten Fleischer, Daragh Mullarkey, and Igor Shvets
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15:15 |
DS 8.2 |
Optical temperature management for high-quality ZnO molecular beam epitaxy — •Maximilian Albert, Christian Golla, Christian Kaspari, Thomas Zettler, and Cedrik Meier
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15:30 |
DS 8.3 |
Tailoring material properties of SiOx thin films by applying an electric field during plasma enhanced atomic layer deposition — •Vivek Beladiya, Martin Becker, Marek Sierka, and Adriana Szeghalmi
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15:45 |
DS 8.4 |
Synthesis of Porous Silicon, Nickel and Carbon Thin Films by Vapor Phase Dealloying — •Stefan Saager, Bert Scheffel, Olaf Zywitzki, and Thomas Modes
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16:00 |
DS 8.5 |
Growth of epitaxial (110) oriented Mn2Au thin films via Molecular Beam Epitaxy — •Daniel Casey, Daragh Mullarkey, and Igor V. Shvets
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16:15 |
DS 8.6 |
Superconducting titanium nitride thin films deposited by plasma enhanced atomic layer deposition — •Luisa Ehmcke, Stefanie Haugg, Kaline Furlan, Gerold Schneider, Robert Blick, and Robert Zierold
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