Dresden 2020 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 10: Focus: High-resolution Lithography and 3D Patterning (Part I) (joint session KFM/CPP/HL)

HL 10.4: Vortrag

Montag, 16. März 2020, 10:40–11:00, TOE 317

Grayscale Lithography: Creating complex 2.5D structures in thick photoresist by direct laser writing — •Dominique Collé — Heidelberg Instruments, Heidelberg, Germany

Heidelberg Instruments's lithography systems make it possible to expose any pattern directly without fabricating a mask, which results in a significantly shorter prototyping cycle. The use of a digital mask also allows some quick modification of the design when necessary. The possibility to modulate the energy of each pixel exposed brings the control over the 3rd dimension. This localized dose modulation can be represented as gray tones in a design between black (no dose / no depth in the resist) and white (highest dose / maximum depth in the resist) with up to 1024 different gray tones. Grayscale lithography opens a new world of application from texturing to micro-optic. Micro lenses array, light diffusers, Fresnel lenses, blazed gratings and diffractive optic elements are some typical micro-structures made with grayscale lithography.