Dresden 2020 – wissenschaftliches Programm
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HL: Fachverband Halbleiterphysik
HL 10: Focus: High-resolution Lithography and 3D Patterning (Part I) (joint session KFM/CPP/HL)
HL 10.7: Vortrag
Montag, 16. März 2020, 12:10–12:30, TOE 317
Optical properties of photoresists for femtosecond 3D printing: Refractive index, extinction, luminescence - dose dependence, aging, heat treatment and comparison between 1-photon and 2-photon exposure — •Michael Schmid, Dominik Ludescher, and Harald Giessen — 4th Physics Institute and Research Center SCoPE, University of Stuttgart, Pfaffenwaldring 57, 70569 Stuttgart, Germany
Femtosecond 3D printing has emerged as an important technology for manufacturing nano- and microscopic optical devices and elements. Detailed knowledge of the dispersion in the visible and near-infrared spectral range is crucial for the design of these optical elements. Here we provide refractive index measurements for different UV-doses, aging times, heat treatment and 2-photon exposed structures for the photoresists IP-S, IP-Dip, IP-L, OrmoComp, IP-Visio, and PO4. We use a modified and automized Pulfrich refractometer setup, utilizing critical angles of total internal reflection with an accuracy of 5· 10−4 in the visible and near-infrared spectral range. We compare Cauchy and Sellmeier fits to the dispersion curves. We also give Abbe numbers and Schott Catalog numbers of the almost entirely polymerized resists. Additionally, we provide quantitative extinction and luminescence measurements for all photoresists.