Dresden 2020 – scientific programme
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HL: Fachverband Halbleiterphysik
HL 17: Materials and devices for quantum technology I
HL 17.2: Talk
Monday, March 16, 2020, 15:15–15:30, POT 112
UHV Lithography for STM Investigations of 3D Topological Insulators-Superconductor Hybrid Arrays — •Michael Schleenvoigt1, Tobias W. Schmitt2, Priyamvada Bhaskar3, Max Vaßen-Carl1, Abdur R. Jalil1, Benjamin Bennemann4, Stefan Trellenkamp4, Florian Lentz4, Gregor Mussler1, Markus Morgenstern3, Peter Schüffelgen1, and Detlev Grützmacher1,2 — 1Peter Grünberg Institute 9, Forschungszentrum Jülich, 52425 Jülich, Germany — 2JARA-FIT Institute Green IT, RWTH Aachen University, 52062 Aachen, Germany — 3II. Institute of Physics B, RWTH University, 52056 Aachen, Germany — 4Helmholtz Nano Facility, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany
Majorana Zero Modes (MZMs) are proposed to arise at the interface of a topological insulator (TI) and an s-wave superconductor (SC). Scanning tunneling microscopy and spectroscopy (STM/STS) enable the investigation of MZMs in such hybrid structures. To achieve high SC-TI interface qualities and protect the exposed TI surfaces, device fabrication calls for ultra-high vacuum (UHV) conditions. I will present a three-step in situ fabrication technique. First, TI arrays consisting of molecular beam epitaxy (MBE) grown (Bi,Sb)2(Te,Se)3 compounds are created via stencil lithography. In the second step, SC islands are deposited on top of the TI arrays. Finally the stencil lithography mask is removed without exposing the structures to ambient conditions to prepare the sample for STM/STS investigations in UHV. Topography and spectroscopy maps verify the viability of the process.