Dresden 2020 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 63: Focus: High-resolution Lithography and 3D Patterning (Part II) (joint session KFM/CPP/HL)

HL 63.5: Hauptvortrag

Donnerstag, 19. März 2020, 11:10–11:40, TOE 317

3D Printing with Electrons - Advances and Opportunities — •Harald Plank — Institute of Electron Microscopy, Graz University of Technology, Graz, Austria

Since the advent of additive manufacturing, this technology class made tremendous progress. While achievable feature sizes continuously decreased from cm's over mm's towards the sub-micron range their 3D possibilities became increasingly powerful. Naturally, there is a strong interest to push 3D printing into the nano-scale, to take advantage of nanoscale effects. Within the small pool of relevant technologies at that scale, Focused Electron Beam Induced Deposition (FEBID) is a highly promising candidate, as it allows additive, direct-write manufacturing of even complex 3D architectures with feature sizes down to 20 nm on most materials and practically any given surface morphology. Together with an increasing availability of precursors with different functionalities, 3D-FEBID has advanced from a trial-and-error laboratory method to a predictable 3D nano-printing technology. In this talk, the audience is first introduced to the basic principles of 3D-FEBID, complemented by recent advances, which strongly increased precision, predictability and reliability. We then present software solutions for the comfortable upfront design of 3D objects and review several application examples, which strongly benefit from the here presented 3D nanofabrication appraoch. To highlight the industrial relevance of 3D-FEBID, we present concepts of advanced nano-probes for application in scanning probe microscopy. We close the talk with a view on current activities, remaining challenges and future opportunities.