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HL: Fachverband Halbleiterphysik

HL 63: Focus: High-resolution Lithography and 3D Patterning (Part II) (joint session KFM/CPP/HL)

HL 63.6: Vortrag

Donnerstag, 19. März 2020, 11:40–12:00, TOE 317

Perfluorinated amidinate compounds for focused electron beam induced deposition (FEBID) — •Katarzyna Madajska and Iwona Szymańska — Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland

FEBID is a direct maskless nanolithography technique, based on the local dissociation of adsorbates upon the irradiation with electrons.[1][2] Silver pentafluoropropionate was applied in the FEBID process yielding 2D and 3D deposits containing up to 70 at. % Ag. [3][4]

Here we report on our study of silver and copper complexes with perfluorinated amidines (CnF2n+1C(=NH)NH2), which are similar in structure to carboxylates but they differ in donor atoms (N,N-donor).

Thermal analysis, EI MS spectrometry, sublimation experiments and temperature variable infrared spectra analysis were carried out to determine the volatility of compounds and their thermal decomposition mechanism. The compounds selected, as based on the results of the volatility, were examined for their sensitivity to the electron beam, using an electron microscope (SEM, TEM).

[1] Utke and A. Gölzhäuser, Angewandte Chemie Int. Ed. 49 (2010) 9328-9330. [2] D. Belić, M. M. Shawrav, E. Bertagnolli, H. D. Wanzenboeck, Beilnstein J. Nanotechnol, 2017, 8, 2530-2543. [3] L. Berger, K. Madajska, I. B. Szymanska, K. Höflich, M. N. Polyakov, J. Jurczyk, C. Guerra-Nuñez, I. Utke, Beilstein J. Nanotechnol., 2018, 9, 224-232. [4] K. Höflich, J. M. Jurczyk, K. Madajska, M. Götz, L. Berger, C. Guerra-Nuñez, C. Haverkamp, I. Szymanska, I Utke, Beilstein J. Nanotechnol., 2018, 9, 842-849.