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HL: Fachverband Halbleiterphysik
HL 63: Focus: High-resolution Lithography and 3D Patterning (Part II) (joint session KFM/CPP/HL)
Donnerstag, 19. März 2020, 09:30–12:20, TOE 317
Chair: Robert Kirchner (TU Dresden)
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09:30 | HL 63.1 | Curvilinear Magnetism: Fabrication and characterization — •Denys Makarov |
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09:50 | HL 63.2 | 3D printing of complex submillimeter-sized wide angle objectives — •Zhen Wang, Ksenia Weber, Simon Thiele, Alois Herkommer, and Harald Giessen |
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10:10 | HL 63.3 | Additive technology for X-ray optical applications — •Adam Kubec, Frieder Koch, and Christian David |
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10:30 | HL 63.4 | Mass-producible microoptical elements by injection compression molding and focused ion beam structured titanium molding tools — •Simon Ristok, Marcel Röder, Simon Thiele, Mario Hentschel, Thomas Günther, André Zimmermann, Alois Herkommer, and Harald Gießen |
| 10:50 | 20 min. break | ||
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11:10 | HL 63.5 | Hauptvortrag: 3D Printing with Electrons - Advances and Opportunities — •Harald Plank |
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11:40 | HL 63.6 | Perfluorinated amidinate compounds for focused electron beam induced deposition (FEBID) — •Katarzyna Madajska and Iwona Szymańska |
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12:00 | HL 63.7 | Synthetic strategies towards FEBID precursors — •Iwona Szymańska and Katarzyna Madajska |