Dresden 2020 –
wissenschaftliches Programm
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HL 66: Thin Oxides and Oxide Layers II (joint session DS/HL)
Donnerstag, 19. März 2020, 11:00–12:30, CHE 91
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11:00 |
HL 66.1 |
Structural, Optical and Electrical Properties of Indium Tungsten Oxide upon High Temperature Annealing — •Dorothee Menzel and Lars Korte
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11:15 |
HL 66.2 |
In-situ observation of sub-unit-cell nonlinear polarization in superlattices of layered oxides — •Johanna Nordlander, Marco Campanini, Marta D. Rossell, Manfred Fiebig, and Morgan Trassin
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11:30 |
HL 66.3 |
Ellipsometric study of defect induced magnetism in spinel ferrite thin films — •Vitaly Zviagin, Chris Sturm, Pablo Esquinazi, Marius Grundmann, and Rüdiger Schmidt-Grund
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11:45 |
HL 66.4 |
Fast sweep and voltage pulse studies on HfO2/TiO2- bilayer resistive switching memories — •Nils Quiring, Felix Cüppers, Alexander Hardtdegen, Susanne Hoffmann-Eifert, and Rainer Waser
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12:00 |
HL 66.5 |
TiOx formation during ALD metal oxide growth on Ti for resistive switches — •Ivonne Bente, Stephan Außen, and Susanne Hoffmann-Eifert
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12:15 |
HL 66.6 |
High resistive NbO2 thin-films for phase-change switching applications — •Julian Stoever, Jos E. Boschker, Nazir Jaber, Saud Bin Anooz, Martin Schmidbauer, Jutta Schwarzkopf, Martin Albrecht, and Klaus Irmscher
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