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Dresden 2020 – scientific programme

The DPG Spring Meeting in Dresden had to be cancelled! Read more ...

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HL: Fachverband Halbleiterphysik

HL 6: Heterostructures, interfaces and surfaces (joint session HL/O)

Monday, March 16, 2020, 09:30–13:00, POT 151

09:30 HL 6.1 Determining the band alignment of copper oxide-gallium oxide heterostructures — •Sebastian Leonard Benz, Martin Becker, Angelika Polity, Sangam Chatterjee, and Peter Jens Klar
09:45 HL 6.2 Nanometer Scale Characterization of Al/TiOx/SiOx Electron Selective Passivating Contacts Utilizing Advanced TEM Methods — •Christoph Flathmann, Tobias Meyer, Valeriya Titova, Jan Schmidt, and Michael Seibt
10:00 HL 6.3 direct insight into the structure-property relation of interfaces from first-principles crystal structure prediction — •lin sun, miguel a. l. marques, and silvana botti
10:15 HL 6.4 Effect of KF and RbF post-deposition treatments on the electronic structure of the CdS/Cu(In,Ga)Se2 interface in thin-film solar cells investigated by Kelvin Probe and Photoelectron Yield Spectroscopy — •Marin Rusu, Tim Kodalle, Leo Choubrac, Sergiu Levcenco, Nicolas Barreau, Christian Kaufmann, Rutger Schlatmann, and Thomas Unold
  10:30 HL 6.5 The contribution has been withdrawn.
  10:45 30 min. break.
11:15 HL 6.6 Invited Talk: Exciton-Polariton Topological Insulator — •Sebastian Klembt
11:45 HL 6.7 Quantum spin Hall quantum point contacts — •niccolo traverso ziani, bjoern trauzettel, christoph fleckenstein, lorenzo privitera, and maura sassetti
12:00 HL 6.8 Correlation of optical properties and interface morphology in type-II semiconductor heterostructures — •Luise Rost, Jannick Lehr, Milan Maradiya, Wolfgang Stolz, and Wolfram Heimbrodt
12:15 HL 6.9 First-principles study of the structural and electronic properties of the GaAsxP1-x surface — •Marsel Karmo and Erich Runge
12:30 HL 6.10 Copper iodide thin films: Dynamic AFM studies of local electrical properties — •Tillmann Stralka, Chang Yang, Holger von Wenckstern, and Marius Grundmann
12:45 HL 6.11 Stability and Tunneling Transport Properties of NiSi2-Si Interfaces — •Florian Fuchs, Sibylle Gemming, and Jörg Schuster
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