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HL: Fachverband Halbleiterphysik
HL 74: Poster IIIA
HL 74.20: Poster
Donnerstag, 19. März 2020, 15:00–17:30, P2/2OG
Optical characterization of ion implanted monolayer molybdenum dichalcogenides — •Minh Bui1, Stefan Rost2, Manuel Auge3, Jhih-Sian Tu1, Sven Borghardt1, Hans Hofsäss3, and Beata Kardynał1 — 1Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich, 52425 Jülich, Germany — 2Peter Grünberg Institut (PGI-1 / IAS-1), Forschungszentrum Jülich, 52425 Jülich, Germany — 3II. Physikalisches Institut, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
Monolayers (MLs) of semiconducting transition metal dichalcogenides (TMDCs) possess unique band structure leading to exotic optical properties, suitable for valley- and exciton-based optoelectronic applications. Tuning those properties is desirable to further exploit their potentials, for which deterministic doping is a viable technique that has proven suitable for bulk semiconductors. Here, implantation with low energy ions is explored as a method to introduce dopant atoms into TMDC MLs, with the prototypical system of Se-implanted MoS2. Isoelectronic substitution of Se for S in MoS2 converts the material into MoSe2xS2(1−x) without creating free carriers. For the optimal compromise between Se incorporation and defect formation, different implantation conditions were investigated, including treatment for healing defects. Structural and electronic effects of implantation on MLs were studied using Raman, reflectance and photoluminescence spectroscopies. Implantation levels much higher than required for doping, up to 20%, were achieved. Results of MoSe2 implanted with P for p-type dopants, and Cr for substitution in Mo sites are also discussed.