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KFM: Fachverband Kristalline Festkörper und deren Mikrostruktur
KFM 15: Postersession KFM
KFM 15.21: Poster
Donnerstag, 19. März 2020, 16:00–18:30, P2/1OG
Laser-based inspection of technical dielectric thin films — •Simon Podendorf1, Yannik Toschke1, Jörg Rischmüller1, Mirco Imlau1, Mareike Schlag2, Kai Brune2, and Hauke Brüning2 — 1School of Physics, Osnabrueck University, Barbarastraße 7, 49076 Osnabrueck, Germany — 2Fraunhofer IFAM, Wiener Strasse 12, 28359 Bremen, Germany
Fast, contactless and non-distructive inspection of technical dielectric thin films is of major importance for the quality and process control in light-alloy industry. Reflectometry, a widely available powerful tool, fails if applied to rough technical samples. It is because of the dominant role of diffuse scattering of the surfaces/interfaces, of inclusions and/or layer imperfections and, thus, a lack of an appropriate layer model.
We have adressed this problem by extending the principle approach of reflectometry considering the role of diffuse and specular scattering, as well. As an example, conversion coatings with a thickness of 20-70 nm on the aluminum alloy AA3003 and different process conditions serve for our systematic study. The layer architecture and its chemical constituents were analyzed in detail using REM and plasma spectroscopy and were used for modeling the reflection of an incident laser beam as a function of wavelength and angle of incidence. As a result, an optical configuration for the inline process control is proposed [M. Imlau et al., J. Oberfl. Techn. 59, 46 (2019)]. Financial support by the AiF in the framework of the program for "‘industrielle Gemeinschaftsforschung"’ (IGF, Vorhaben Nr. 19579 N) and the Bundesministerium für Wirtschaft und Energie (BMWi) is gratefully acknowledged.