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MA: Fachverband Magnetismus

MA 57: Posters Magnetism II

MA 57.7: Poster

Donnerstag, 19. März 2020, 15:00–18:00, P3

Influence of post annealing on structural, magnetic and electric properties of sputter-deposited NiFe2O4 thin films — •Jan Biedinger, Luca Marnitz, Karsten Rott, and Timo Kuschel — Center for Spineletronic Materials and Devices, Bielefeld University, Germany

In the presented work, the structural, magnetic and electric properties of NiFe2O4 (NFO) thin films treated by post annealing in pure oxygen atmosphere have been studied. Therefore, NFO films (45   nm) were prepared via reactive dc magnetron co-sputtering on MgAl2O4 substrates [1] and post annealed in-situ with temperatures ranging from 350^∘C to 700^∘C. Each sample was subsequently characterized by ex-situ means of x-ray fluorescence, x-ray reflectivity, x-ray diffraction and alternating gradient magnetometry. Additionally, resistivity measurements have been performed to investigate the oxygen content of the NFO films [2,3]. The ferrimagnetic insulating characteristic was identified for all treated samples. According to the structural analysis, the out-of-plane lattice constant decreased by increasing the annealing temperature, indicating more bulk-like structural properties, whereas the film roughness rose for the highest temperature of 700^∘C. In a next step, these films will be used for thermally induced spin transport experiments.

[1] C. Klewe et al., J. Appl. Phys. 115, 123903 (2014).

[2] P. Bougiatioti et al., J. Appl. Phys. 122, 225101 (2017).

[3] P. Bougiatioti et al., Phys. Rev. Lett. 119, 227205 (2017).