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MM: Fachverband Metall- und Materialphysik
MM 25: Liquid and Amorphous Metals - Structure
MM 25.3: Vortrag
Dienstag, 17. März 2020, 12:15–12:30, IFW D
Controlling the Effective Cooling Rate upon Magnetron Sputter Deposition of Glassy Ge15Te85 — •Julian Pries1, Shuai Wei1, Felix Hoff1, Pierre Lucas2, and Matthias Wuttig1,3 — 1Institute of Physiks IA, RWTH Aachen — 2Department of Material Science and Engineering, University of Arizona — 3PGI-10, Forschungszentrum Jülich
A reduction of the enthalpy state is accompanied by a desirable stabilization of the glass. In this study, we demonstrate the relationship between the voltage applied in the sputtering process and the resulting enthalpy state. Due to this correspondence, it is possible to assign an effective cooling rate to the sputtering process, which decreases by about three orders of magnitude when the voltage is increased by ~100 V. This shows that the sputtering voltage as a new and decisive parameter can manipulate the fictive temperature of a glass, which opens the door to the design of ultra-stable, but also ultra-unstable glasses.