Dresden 2020 – scientific programme

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MM: Fachverband Metall- und Materialphysik

MM 30: Poster Session II

MM 30.2: Poster

Tuesday, March 17, 2020, 18:15–20:00, P4

Resolving the grain boundary structure in nanocrystalline titanium thin films — •Vivek Devulapalli, Christian H. Liebscher, and Gerhard Dehm — Max-Planck-Institut für Eisenforschung GmbH, Düsseldorf, Germany

Titanium (Ti) is an important engineering material owing to its high strength-to-weight ratio and biocompatibility. Nanocrystalline Ti (nc-Ti) can have many engineering applications making it necessary to understand the role of interfaces on material properties. However, direct atomic scale observations of GB structures in Ti are lacking and are revealed in this study using aberration corrected scanning transmission electron microscopy (STEM). In a first step, the microstructure evolution of Ti thin films obtained by different deposited techniques was investigated. Substrate temperature, ion flux and growth rate were varied to obtain textured thin films with defined tilt grain boundaries. The global film microstructure, which varied from single crystalline to nano-crystalline with different degrees of texture, were then investigated using XRD, SEM and EBSD. A nc-Ti film deposited on Si (100) contained a myriad of low angle grain boundaries and showed strong [0001] fibre texture. The atomic structure of these boundaries was further investigated by STEM. A grain boundary with 13 deg misorientation and [0001] tilt axis was composed of a dense network of [11-20] edge dislocations with a uniform spacing of 1.3nm. The intrinsic details of film growth and the resulting grain boundary structures will be discussed.