Dresden 2020 – scientific programme
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O: Fachverband Oberflächenphysik
O 21: Interfaces and Thin Films I (joint session CPP/DY/O)
O 21.2: Talk
Monday, March 16, 2020, 16:45–17:00, ZEU 260
In situ GISAXS Investigations of Multi-responsive Block Copolymer Thin Films during Solvent Vapor Annealing — •Florian A. Jung1, Panayiota A. Panteli2, Detlef-M. Smilgies3, Dorthe Posselt4, Constantinos Tsitsilianis5, Costas S. Patrickios2, and Christine M. Papadakis1 — 1Physics Department, Soft Matter Group, Technical University of Munich, Garching, Germany — 2Department of Chemistry, University of Cyprus, Nicosia, Cyprus — 3Wilson Laboratory, Cornell University, Ithaca, USA — 4Department of Science and Environment, Roskilde University, Denmark — 5Department of Chemical Engineering, University of Patras, Greece
Responsive block copolymer thin films are of interest for many applications, e.g. as fast sensors or switchable membranes. In the present work, we investigate a pH and temperature responsive pentablock quaterpolymer in thin films during solvent vapor annealing (SVA). The end blocks are temperature-responsive and hydrophobic while the midblock is pH-responsive and hydrophilic. Structural information was obtained by employing in situ grazing-incidence small-angle X-ray scattering (GISAXS) and by model fitting the obtained 2D patterns. We find that, varying the pH value of the solution for spin-coating as well as the nature of the solvent used for SVA gives the opportunity to tune the structures in a wide range.