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O: Fachverband Oberflächenphysik

O 50: Poster Session - Plasmonics and Nanooptics: Fabrication and Characterization

O 50.10: Poster

Dienstag, 17. März 2020, 18:15–20:00, P2/EG

Nanostructuring with the aid of atomic layer deposition — •Benjamin Trzeciak¹, Eric N'Dohi², Florian Laible¹, Christoph Dreser¹, and Markus Turad¹ — ¹1Institute for Applied Physics and Core Facility LISA+, Eberhard Karls University Tübingen, Germany — ²2University of Technology Troyes, France

Thin layers are indispensable in today's fabrication of nanostructures. In order to reduce the size of complex and innovative structures like MEMS sensors, fuel or solar cells it is not only necessary to produce smaller conductive structures. It is also crucial to be able to insulate the structures with even thinner layers. Atomic layer deposition (ALD) offers a solution for depositing ultra-thin layers with the accuracy of single layers. Their high aspect ratio, homogeneity, linear and isotropic growth are regarded as major advantages of this deposition technique.

In this work the technique of ALD is utilized in combination with plasmonic nanostructures, in particular silver nanodiscs. Non-passivated silver easily oxidizes or sulfidizes, which means that its optical properties are not stable over time. In order to guarantee long-term stability and maintain their optical properties, such as plasmonic resonances, the silver discs are passivate with a closed layer of minimal thickness. Building on this, ALD layers can be used as spacers with Angstrom distance control for hybrid structures such as dimers or nanostructure-quantumdot-systems.

The mechanism of ALD and the methods of ellipsometry and X-ray diffraction will be briefly discussed together with the preparation of silver nanodiscs and their spectra.