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O: Fachverband Oberflächenphysik

O 99: Organic Molecules on Inorganic Substrates VI: Adsorption, Growth and Networks

O 99.10: Vortrag

Donnerstag, 19. März 2020, 13:00–13:15, GER 38

Growth of N-heterocyclic carbenes on a deactivated semiconductor surface — •Martin Franz¹, Sandhya Chandola², Maximilian Koy³, Robert Zielinski², Matthias Freitag³, Conor Hogan⁴, Frank Glorius³, Norbert Esser², and Mario Dähne¹ — ¹Institut für Festkörperphysik, Technische Universität Berlin, D-10623 Berlin, Germany — ²Leibniz-Institut für Analytische Wissenschaften - ISAS e.V., 12489 Berlin, Germany — ³Organisch-Chemisches Institut, Westfälische Wilhelms-Universität Münster, D-48149 Münster, Germany — ⁴Istituto di Struttura della Materia-CNR (ISM-CNR), 00133 Rome, Italy

Self-assembled monolayers based on N-heterocyclic carbenes (NHCs) are promising for surface functionalization as ultra-stable alternatives to thiol based systems. Here, we report on the ordered growth of NHCs on silicon, demonstrating the versatility of NHCs as anchors for surface functionalization. In a detailed scanning tunneling microscopy and first principles calculations study, we investigate the adsorption of the prototypical NHC 1,3-bis(dimethyl)imidazolium (IMe) on the deactivated Si(111)√3×√3R30^∘-B surface. We find a vertical adsorption geometry of the molecules above the Si adatoms of the substrate. At low IMe coverage, a rotation of the molecules leads to a round appearance in the STM images, while at high NHC coverages an ordering of the molecules into a 2√3×√3R30^∘ superstructure is observed.