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P: Fachverband Plasmaphysik

P 10: Poster Session 2

P 10.28: Poster

Dienstag, 10. März 2020, 16:30–18:30, Empore Lichthof

Control of Spokes in HiPIMS Discharge — •Mathews George and Achim von Keudell — Experimentalphysik II, Ruhr-University Bochum

Magnetron Sputtering is a Plasma Vapour Deposition (PVD) process widely used in industry and scientific communities. HiPIMS produces plasmas of very high density of the order 10¹⁹m⁻³ without overheating the target. The plasma appears to be homogeneous to the human eye, but shows localised zones of high brightness rotating in the E x B direction when observed with an ICCD camera with exposure times below 1µs[1] [3]. These so called spokes are assumed to play a role in the transport of particles and energy away from the target [2]. The primary objective is the control of spokes by using externally applied field on a Langmuir probe in HiPIMS. The major motive behind spoke control is to regulate the deposition rate and quality of the film. DCMS was chosen for the starting phase since the spokes in DC regime are more uniform compared to HiPIMS. Amplified sinusoidal voltage signals are applied on a Langmuir probe to draw electron current from the plasma at the highest gradients in the E x B direction. The variation of spoke frequency or any kind of influence on the spokes characteristics with respect to the applied frequency are detected by measuring the spoke frequency using a photomultiplier. [1] A Hecimovic, A von Keudell J. Phys. D: Appl. Phys. 51 (2018) 453001 (15pp) [2] N Brenning, et al. 2013 J. Phys. D: Appl. Phys. 46 084005 [3] Andre Anders, Yuchen Yang Appl. Phys. Lett.111, 064103 (2017)