Hannover 2020 – scientific programme

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P: Fachverband Plasmaphysik

P 16: Poster Session 3

P 16.21: Poster

Wednesday, March 11, 2020, 16:30–18:30, Empore Lichthof

Diagnostic of magnetron sputtering deposition in process plasma using thermal probes — •Felix Schlichting, Julia Cipo, and Holger Kersten — Institute of Experimental and Applied Physics, University of Kiel, Germany

In recent studies the intrinsic properties, determined by the I-V characteristics of magnetised films deposited by magnetron sputtering, were correlated with the plasma parameters obtained by passive thermal probe (ptp) measurements [1]. By measuring the energy flux coming from the target and plasma in a magnetron sputtering source, the functional dependence between deposition properties and film properties can be analysed. This knowledge is important in developing memristive devices, used in neuromorphic engineering or image processing algorithms, and for understanding the signal-to-noise ratio in magnetic field sensors. The ptp can simultaneously be used for energy flux measurements and as a planar Langmuir probe, yielding also the electrical properties of the plasma. The parameters have been determined in radial position across the substrate region.

[1] F. Zahari et al., Journal of Vacuum Science & Technology B 37, 061203 (2019)