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P: Fachverband Plasmaphysik
P 3: Low-temperature plasma and applications 1
P 3.2: Vortrag
Montag, 9. März 2020, 14:30–14:45, b302
MEMS sensor for the determination of ion energy and ion angle distribution functions in low pressure plasmas — •Marcel Melzer1, Kerstin Rössel2, Jan Trieschmann2, Chris Stöckel1,3, Sven Zimmermann1,3, and Thomas Mussenbrock2 — 1Technische Universität Chemnitz, Zentrum für Mikrotechnologien, 09126 Chemnitz — 2Brandenburgische Technische Universität Cottbus-Senftenberg, Theoretische Elektrotechnik, 03046 Cottbus — 3Fraunhofer-Institut für Elektronische Nanosysteme, Abteilung Multi Device Integration, 09126 Chemnitz
Low pressure plasmas are one of the most important tools for the manufacturing of integrated circuits and enable, for example, the dry etching of transistor structures with feature sizes below 14 nm. For such sophisticated plasma processes both the ion energy distribution function (IEDF) and the ion angular distribution function (IADF) of the applied plasmas are crucial parameters for the creation of the desired structures. By combining a silicon-manufactured retarding field analyzer and a microelectromechanical system (MEMS) for angular selection of the ions to be detected, the IEDF and the IADF are to be measured simultaneously by a novel sensor element. In this work, simulation results of the three-dimensional ion dynamics within the sensor system are presented. Furthermore, the first results of the measurements and the current experimental status are discussed.