Hannover 2020 – wissenschaftliches Programm
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Q: Fachverband Quantenoptik und Photonik
Q 2: Optomechanics
Q 2.5: Vortrag
Montag, 9. März 2020, 12:00–12:15, a310
Investigation of mechanical losses and photoelasticity in mechanical oscillators for applications in optomechanical devices — •Jan Meyer1, Johannes Dickmann2, Maik Bertke3, Richard Norte4, Peter Steeneken5, Erwin Peiner3, and Stefanie Kroker1,2 — 1LENA Laboratory for Emerging Nanometrology, TU Braunschweig, Pockelsstraße 14, 38106 Braunschweig, Germany — 2Physikalisch-Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig, Germany — 3Institut für Halbleitertechnik, TU Braunschweig, Hans-Sommer-Str. 66, D-38106 Braunschweig, Germany — 4Kavli Institute of Nanoscience, Delft University of Technology, Delft, 2628CJ, The Netherlands — 5Solid State Physics Laboratory, Materials Science Centre, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
The coupling of mechanical motion and optical fields is in many applications of interest like molecule detection, material investigation and sensing as well as in fundamental quantum experiments such as ground state cooling. The mechanical loss of oscillators and the photoelasticity of the involved materials are critical parameters for the coupling and thus for the design of optomechanical devices. The loss mechanisms in micro- and nanooscillators are still hardly known. In this contribution we demonstrate how temperature dependent measurements of first mechanical loss and second photoelasticity in mechanical oscillators perform. We present measurement results on silicon and diamond which are supported by finite element modelling and semi-analytical models.