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HL: Fachverband Halbleiterphysik

HL 3: Poster Session I

HL 3.16: Poster

Montag, 27. September 2021, 10:00–13:00, P

Improving the Visibility of Graphene on III-V semiconductors — •Timo Kruck, A.D. Wieck, and Arne Ludwig — Angewandte Festkörperphysik, Ruhr-Universität Bochum, Universitätsstraße 150, D-44780 Bochum

In a first step towards working with graphene on III-V semiconductors the visibility of graphene will be analyzed and improved with an optical microscope in the NIR range.
Each layer of graphene absorbs a certain fraction of light in a wide spectral range from visible to infrared. This fraction is πα ∼ 2.3%, where α is the fine-structure constant. This absorption can be enhanced by superimposing it on certain photonic structures. For this purpose, a DBR based on GaAs and AlAs with an antireflection layer was grown on a GaAs substrate with MBE and according reflectance spectra are measured. Graphene has been exfoliated on this structure and is observed with an optical microscope illuminated by a NIR VCSEL. The resulting contrast produced by a different number of layers is analyzed and compared with simulations based on the transfer matrix method (TMM). The TMM simulations are supported by reflectometry to account for deviations of the as-grown structure from the intended structure.