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MA: Fachverband Magnetismus
MA 3: Posters Magnetism I
MA 3.18: Poster
Montag, 27. September 2021, 13:30–16:30, P
Simulation of the FEBID process — •Alexander Kuprava1 and Michael Huth2 — 1Goethe Universität Frankfurt, Germany — 2Goethe Universität Frankfurt, Germany
Focused electron beam induced deposition is a direct-write nano-fabrication technology with unique advantages for free-form 3D deposition. However, a shape-true transfer from a 3D CAD model target structure to the actual nano-deposit is a non-trivial task. Here we present our modular computer simulation framework that was developed to simulate FEBID process in order to assist the study of the growth of 3D structures. The program includes an electron-beam generation and an electron-solid interaction module, a diffusion module and a reaction equation solver. A Monte Carlo (MC) simulation was utilized for scattered electron trajectories generation and inelastic electron-solid interaction on a cellular structured 3D grid. The simulation details are discussed which include applied structured grid-based simulation practices, the numerical solution of the reaction equation, the diffusion simulation concept and the MC simulation of primary and secondary electron flux. The program was used to simulate the growth of high aspect-ratio Pt-based nanoscale pillars with a stationary Gaussian electron beam using (CH3)3CpCH3Pt(IV) as a precursor. The simulation results were compared to the experimentally grown structures regarding shape trueness and growth rate.