SKM 2021 – scientific programme

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SMI: Science meets Industry

SMI 1: Science meets industry

SMI 1.6: Talk

Wednesday, September 29, 2021, 15:10–15:25, H1

Novel approaches for future challenges in nanofabrication — •Jörg Stodolka — Raith GmbH, Konrad-Adenauer-Allee 8, 44263 Dortmund

Requirements in Electron Beam Lithography (EBL) are becoming increasingly demanding, often exceeding what is possible when using standard patterning technologies. Improving and combining well known technologies enables new approaches for future developments.

We present two examples where cooperation with research groups gave room to a full new range of applications: Stitch-free writing of gratings with sub-nanometer periodicity control for high precision DFB lasers, and EBL at positions preselected by local generation of light detected by Cathodoluminescence spectroscopy for high yield fabrication of quantum devices.