SMuK 2021 – scientific programme

Parts | Days | Selection | Search | Updates | Downloads | Help

P: Fachverband Plasmaphysik

P 3: Atmospheric Pressure Plasmas and their Applications I

P 3.5: Talk

Monday, August 30, 2021, 17:45–18:00, H6

Photo-chemistry of organosilicon and hydrocarbon precursors initiated by VUV/UV-radiation from an atmospheric pressure RF plasma jet in argon and helium — •Tristan Winzer, Natascha Blosczyk, and Jan Benedikt — Institute for Experimental and Applied Physics, Kiel University, Kiel, Germany

Deposition of thin films using atmospheric pressure plasmas (APPs) has received increased interest in recent years. This is because APPs do not require expensive vacuum chambers and continuous material treatment is possible. However, hot electrons in the plasma lead to formation of negative ions and subsequently to particle formation, which can be incorporated as defects in the film.

APPs ignited in argon or helium emit intense VUV/UV-radiation from noble gas excimer species. In this study, this radiation is utilized to create ions and free radicals from a gas mixture of helium/argon and organosilicon or hydrocarbon precursors. A plasma source for separation of plasma generated species and photo-chemistry products will be presented. The electrons created by photo-ionization of the precursor gas remain cold and the production of negative ions via electron attachment is omitted. The photo-ionization products in dependence of plasma parameters and reactive gas admixture will be analysed using positive ion mass spectrometry. Deposited films are characterized using Fourier-transform infrared spectroscopy (FTIR) and scanning electron microscopy (SEM).