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O: Fachverband Oberflächenphysik
O 105: Poster Session VIII: Graphene and beyond II
O 105.11: Poster
Thursday, March 4, 2021, 13:30–15:30, P
The true corrugation of monolayer h-BN on Rh(111) — Luis Henrique de Lima1,2, Thomas Greber3, and •Matthias Muntwiler2 — 1Universidade Federal do ABC, Santo Andre, Brazil — 2Paul Scherrer Institut, Villigen, Switzerland — 3Universität Zürich, Zürich, Switzerland
Monolayer hexagonal boron nitride (h-BN) grown on the (111) surface of rhodium exhibits an intriguing corrugation pattern called "nanomesh" with a lattice constant of 3.2 nm. Despite numerous experimental and theoretical studies, structural details such as the corrugation amplitude have been difficult to determine quantitatively due to the differences in chemical and electronic environments in the strongly bound pore regions and the weakly bound wire regions of the corrugated structure. For reliable results it is important to probe the structure with a method that is inherently sensitive to the positions of the atomic cores rather than electron density.
In this contribution, we determine the corrugation of h-BN nanomesh from synchrotron based angle- and energy-resolved photoelectron diffraction measurements with chemical state resolution. By comparing measured data to multiple-scattering simulations true adsorbate-substrate distance can be measured with high precision, avoiding pitfalls of apparent topography observed in scanning probe techniques.
L. H. de Lima et al., 2D Mater. 7, 035006 (2020)