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O: Fachverband Oberflächenphysik
O 19: Poster Session II: Organic molecules on inorganic substrates: Adsorption and growth II
O 19.5: Poster
Monday, March 1, 2021, 13:30–15:30, P
Surface-controlled reversal of the selectivity of halogen bonds — Jalmar Tschakert1, Qigang Zhong1, Daniel Martin-Jimenez1, Jaime Carracedo-Cosme2, Carlos Romero Muniz2, Pascal Henkel3, Tobias Schlöder3, Sebastian Ahles4, Doreen Mollenhauer3, Hermann A. Wegner4, Pablo Puo2, Ruben Perez2, Andre Schirmeisen1, and •Daniel Ebeling1 — 1Institute of Applied Physics, Justus Liebig University Giessen, Germany — 2Departamento de Física Teórica de la Materia Condensada, Universidad Autónoma de Madrid, Spain — 3Institute of Physical Chemistry, Justus Liebig University Giessen, Germany — 4Institute of Organic Chemistry, Justus Liebig University Giessen, Germany
Halogen bonds are ideally suited for designing molecular assemblies because of their strong directionality and the possibility of tuning the interactions by using different types of halogens or molecular moieties. This is interesting for applications in supramolecular chemistry, crystal engineering, or drug design. Here, we present an approach for tuning the 2D self-assembly process of organic molecules by adsorption to reactive vs. inert metal surfaces. [1] Therewith, the order of halogen bond strengths that is known from gas phase or liquids can be reversed. Our approach relies on adjusting the molecular charge distribution, i.e., the σ -hole, by molecule-substrate interactions. The polarizability of the halogen and the reactiveness of the metal substrate are serving as control parameters. Our results establish the surface as a control knob for tuning molecular assemblies by reversing the selectivity of bonding sites. [1] Tschakert et al. Nature Communications 11, 5630 (2020)