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O: Fachverband Oberflächenphysik

O 93: Poster Session VII: Graphene and beyond I

O 93.12: Poster

Thursday, March 4, 2021, 10:30–12:30, P

Hetero-Stacking of 2D Materials by Sequential Chemical Vapour Deposition — •Nicolas Néel, Alexander Mehler, and Jörg Kröger — Institut für Physik, Technische Universität Ilmenau, D-98693 Ilmenau, Germany

A multi-step method that enables the growth of graphene on hexagonal boron nitride (h-BN) on Pt(111) is presented. Using borazane (BNH6) as a molecular precursor, h-BN is grown on the surface in the first step. In a next step, a sufficiently thick Pt film is adsorbed and buries the h-BN mesh. It acts as a catalyst for the subsequent growth of graphene via the chemical vapour deposition of ethylene (C2H4). The last step involves the thermally induced entire intercalation of the Pt film beneath h-BN giving rise to large surface regions of a graphene/h-BN stacking. A unique moiré superstructure results from the h-BN-Pt interface. Upon reducing the tip-sample separation an additional √3×√3 R 30^∘ superlattice gradually appears.