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K: Fachverband Kurzzeit- und angewandte Laserphysik

	Di, 10:30–12:00	K-H4	K 1: Laser Systems
	Di, 16:30–18:30	P	K 2: Poster
	Mi, 14:00–15:30	K-H4	K 3: Pulsed Power - XUV and EUV Sources and their Applications
	Mi, 15:30–16:00	K-MV	K 4: Annual General Meeting
	Mi, 16:30–17:45	K-H4	K 5: New Methods and Laser Diagnostics
	Do, 10:30–12:15	K-H4	K 6: Laser-Beam Matter Interaction - Laser Applications I
	Do, 14:00–15:45	K-H4	K 7: Laser-Beam Matter Interaction - Laser Applications II