Regensburg 2022 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 20: Poster

DS 20.17: Poster

Mittwoch, 7. September 2022, 16:00–18:00, P3

In-situ spectroscopic ellipsometry analysis of SiO2 on Si under different atmosphere and temperature — •Xinyu Zhou, Younes Slimi, Stefan Krischok, and Rüdiger Schmidt-Grund — Technische Universität Ilmenau, Fachgebiet Technische Physik I, Weimarer Strafte 32, 98693 Ilmenau, Germany

In-situ Spectroscopic ellipsometry has been applied to obtain optical constants and thin film thicknesses of SiO2 on Si under different atmospheres (nitrogen, dry air) and temperatures. We found changes in refractive index and thickness of the SiO2 layer under different conditions due to oxidation and material ablation. We further present our recent developments in building up an in-situ ellipsometry system for photo-electrochemical applications.