Regensburg 2022 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 20: Poster
DS 20.35: Poster
Mittwoch, 7. September 2022, 16:00–18:00, P3
Epitaxial growth of IrO2(110) thin films on TiO2(110) substrates by pulsed-laser-deposition — •Tim Waldsauer1, Philipp Kessler1, Theodore Pellegrin1, Christopher Reiser1, Ralph Claessen1, Vedran Jovic2, and Simon Moser1 — 1JMU Physikalisches Institut, am Hubland, Würzburg, Germany — 2GNS National Isotope Center, Gracefield Rdd, Gracefield, New Zealand
Iridium dioxide (IrO2), a state-of-the-art catalyst for the electrocatalytic oxygen evolution reaction in water splitting, has recently been shown to exhibit exotic physical phenomena such as the inverse spin Hall effect. The latter is supposed to promote easy switching of its majority charge carriers. For both fundamental spectroscopic studies as well as device applications, IrO2 samples of high bulk and surface crystalline order are required. Here, we present a growth study of rutile IrO2(110) thin films on TiO2(110) substrates by pulsed-laser-deposition (PLD). Film characterization by AFM, RHEED and XPS shows stochiometric growth of thin films with high bulk crystallinity but a granular surface at higher thicknesses. Strategies to enhance the surface quality, e.g., through utilization of an oxygen plasma are outlined and first results are presented.