Regensburg 2022 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 5: Organic Thin Films, Organic-Inorganic Interfaces

DS 5.2: Vortrag

Montag, 5. September 2022, 11:45–12:00, H17

Low-Temperature Atomic Layer Deposition of Al2O3 Thin Films on Spin-Coated Carbon Nanomembranes — •Jan Biedinger, Natalie Frese, Raphael Dalpke, Bernhard Kaltschmidt, Martin Wortmann, Andreas Hütten, Armin Gölzhäuser, and Günter Reiss — Bielefeld University, Germany

Carbon nanomembranes are stable, carbon-based 2D sheets that have been investigated in recent years due to their wide range of potential applications, in nanofiltration, nanoelectromechanical systems, microelectronics or energy storage [1]. Atomic layer deposition relies on alternating self-limiting gas-surface reactions, resulting in smooth, conformal and defect-free coatings with precise thickness control [2]. In the presented work, carbon nanomembranes were coated with aluminum oxide (Al2O3) via a thermal atomic layer deposition process at a substrate temperature of 60^∘C including the reactants trimethylaluminum and water. Structural and compositional investigations of these bilayer systems by atomic force, helium ion and transmission electron microscopy as well as depth profile X-ray photoelectron spectroscopy and energy dispersive X-ray analysis, respectively, reveal a homogeneous and conformal coating of the entire sample, resulting in effective surface modification. In addition, gas permeation measurements were carried out to explore potential applications of such hybrid membranes, demonstrating atomic layer deposition offers a simple way of tuning carbon nanomembranes.

[1] A. Turchanin and A. Gölzhäuser, Adv. Mater. 28, 6075 (2016)

[2] S. M. George, Chem. Rev. 110, 111 (2010)