Regensburg 2022 – scientific programme
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DS: Fachverband Dünne Schichten
DS 6: Focus Session: Innovative GaN-based High-power Devices: Growth, Characterization, Simulation, Application 2
DS 6.3: Talk
Monday, September 5, 2022, 16:00–16:15, H17
Metal micro-contacts deposited by focused electron and ion beam: impact on electrical properties — •Konstantin Wein, Gordon Schmidt, Frank Bertram, Silke Petzold, Peter Veit, Christoph Berger, André Strittmatter, and Jürgen Christen — Otto-von-Guericke-University Magdeburg, Magdeburg, Germany
In this study, we want to concentrate on the local deposition of platinum and tungsten as metal micro-contacts by electron- as well as ion-beam in a focused ion beam microscope (FIB). We are using a Thermo Fisher Scientific Scios 2 HighVac dual-beam with liquid gallium ion source. Either the focused electron beam or the ion beam are used to crack the precursor molecule bonds and induce the complex metal deposition process.
For the investigation of the electrical properties Pt/W stripes were deposited between macroscopic lithographic Au pads on top of insulating SiO2/Si template. Parameters like Ga- and e-beam current, acceleration voltage, dwell time and pixel overlap were systematically investigated and optimized with regard to best electrical properties. The trade-off between efficient incorporation of conductive material and sputtering has to be determined. We observe almost insulating properties for layers deposited by electron beam radiation. On the other hand, the ion beam induced deposition layers behave ohmic and exhibit electrical conductivity up to 4.6105/m for tungsten.