Regensburg 2022 – scientific programme
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KFM: Fachverband Kristalline Festkörper und deren Mikrostruktur
KFM 25: Poster
KFM 25.6: Poster
Thursday, September 8, 2022, 15:00–18:00, P2
An X-ray diffraction studies on AlCrVY(O)N thin films. — •Eric Schneider1, Michael Paulus1, Nelson Filipe Lopes Dias1, David Kokalj2, Dominic Stangier2, and Wolfgang Tillmann2 — 1Fakultät Physik/DELTA TU Dortmund University, 44221 Dortmund, Germany — 2Institute of Materials Engineering, Dortmund, Germany
The aim of this project is to gain a fundamental understanding of the dependence between deposition parameters, layer structure and oxidation behavior of AlCrVY(O)N coatings. For this purpose, the coating systems were deposited on a WC-Co composite substrate by DC sputtering and high-energy pulse magnetron sputtering (HiPIMS). In addition to this, individual process parameters such as BIAS voltage and substrate temperature are varied to determine their influence on the thin films structure. For the investigation of the samples we used synchrotron radiation at beamline BL9 of the synchrotron radiation source DELTA (Dortmund, Germany) to perform XRD measurements. The samples were heated in an heating cell to temperatures up to 1000∘C to study their oxidation behavior. Depending on the process parameters, different oxidation behaviour and residual stresses present in the samples were observed. We thank DELTA for providing synchrotron radiation. This work was supported by the DFG via TO 169/21-1.