Regensburg 2022 – wissenschaftliches Programm

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MA: Fachverband Magnetismus

MA 28: Magnonics 2

MA 28.8: Vortrag

Donnerstag, 8. September 2022, 11:15–11:30, H43

Direct maskless magnetic patterning using a cobalt focused ion beam — Javier Pablo-Navarro¹, •Kilian Lenz¹, Nico Klingner¹, Gregor Hlawacek¹, Ryszard Narkowicz¹, Lothar Bischoff¹, Rene Hübner¹, Wolfgang Pilz², Fabian Meyer², Paul Mazarov², and Jürgen Lindner¹ — ¹Institut für Ionenstrahlphysik und Materialforschung, Helmholtz-Zentrum Dresden-Rossendorf, 01328 Dresden — ²Raith GmbH, Konrad-Adenauer-Allee 8, 44263 Dortmund

We present direct maskless magnetic patterning of ferromagnetic nanostructures using a novel liquid metal alloy ion source for focused ion beam systems (FIB). We used a Co₃₆Nd₆₄ alloy as the FIB source. A Wien mass filter allows for quick switching between the ion species in the alloy without changing the source. A single 5× 1× 0.05 µm³ permalloy strip served as the sample. Using the FIB we implanted a 300 nm wide track with Co ions. We observed the Co-induced changes by measuring the sample with microresonator ferromagnetic resonance before and after the implantation. Structures as small as 30 nm can be implanted up to a concentration of 10 % at the surface. Such lateral resolution is hard to reach for other lithographic methods. In contrast to electron beam lithography with broad beam ion implantation, the maskless FIB process does not require the complicated and difficult removal of the ion-hardened resist if optical measurements like BLS or MOKE are needed.