Regensburg 2022 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 35: Poster 2
MA 35.64: Poster
Donnerstag, 8. September 2022, 16:00–18:00, P4
Two-photon lithography as a fabrication tool for 3D curved magnetic thin film arrays — •Christian Janzen1, Sapida Akhundzada1, Arne Vereijken1, Michał Matczak2, Piotr Kuświk2, Arno Ehresmann1, and Michael Vogel1 — 1Institute of Physics and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Heinrich-Plett-Str. 40, 34132 Kassel, DE — 2Institute of Molecular Physics, Polish Academy of Science, ul. Mariana Smoluchowskiego 17 60-179 Poznań, PL
Fabrication of 3D magnetic nanostructures of complex geometry is a challenging task not easily achievable by standard lithography techniques. Two-photon lithography exploits the non-linear absorption properties of the utilized resist to initialize its polymerization at the volume of highest intensity, called voxel. By manipulating the three-dimensional position of the voxel, it is possible to prepare microstructures with varying Gaussian curvature (e.g., torus), being used as templates for the deposition of magnetic thin films. For preparing high-quality thin films, minimal surface roughness is required. Hence, the latter was investigated by atomic force microscopy depending on process parameters. By spatially separating the curved template from the substrate surface with an additional spacer, the magnetostatic interaction between the magnetic cap and the flat full film becomes negligible. Individual template structures are written with variable spacing to their nearest neighbors, enabling the magnetostatic interaction via strayfields as a tunable parameter of the interaction within the magnetic array.