Regensburg 2022 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 35: Poster 2
MA 35.65: Poster
Donnerstag, 8. September 2022, 16:00–18:00, P4
Applications of 3D Nano-Lithography in Magnetism — •Jana Kredl1, Christian Denker1, Cornelius Fendler2, Robin Silber3, Hauke Heyen1, Tristan Winkel1, Finn-F. Stiewe1, Nina Meyer1, Tobias Tubandt1, Neha Jha1, Jakob Walowski1, Marcel Kohlmann1, Julia Betune1, Chris Badenhorst1, Alena Rong1, Mark Doerr1, Raghvendra Palankar1, Mihaela Delcea1, Uwe T. Bornscheuer1, Robert Blick2, Swadhin Mandal4, Alexander Paarmann5, and Markus Münzenberg1 — 1University of Greifswald, Germany — 2Universität Hamburg, Germany — 3VŠB-Technical University of Ostrava, Czech Republic — 4Indian Institute of Science Education and Research Kolkata, India — 5Fritz Haber Institute of the Max Planck Society, Berlin, Germany
3D 2-Photon-Lithography, originally developed for 3D photonic crystals, opens a wide range of new possible applications in many fields, e.g. life sciences, micro-optics and mechanics. We will present our recent applications of 3D 2-Photon-lithography and show 3D evaporation masks for in-situ device fabrication using different deposition angles, infra-red laser light focusing lenses directly fabricated on optical fibers, tunnel structures for guiding growth of neurons [1], pillars for investigation of cell mechanics and master-mold fabrication for Polydimethylsiloxane (PDMS) micro-fluidic channels. Based on our experience we will discuss possible applications in magnetism. [1] C. Fendler et al., Adv. Biosys. 5 (2019) doi: 10.1002/adbi.201970054