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O: Fachverband Oberflächenphysik
O 19: Poster Monday: Scanning Probe Techniques 1
O 19.4: Poster
Montag, 5. September 2022, 18:00–20:00, P4
Nanoscale capacitance and dielectric permittivity measurements — •Pascal Rohrbeck1, Lukas Drago Cavar1,2, Peter Reichel2, and Stefan A. L. Weber1,2 — 1Max Planck Institute for polymer research, Department physics at interfaces, Ackermannweg 10, 55128 Mainz, Germany — 2Johannes Gutenberg University, Department of Physics, Staudingerweg 10, 55128 Mainz, Germany
The knowledge of capacitance and dielectric properties in the nanoscale is important to understand the basic physics of semiconductor materials, such as solar cells or battery materials.[1]
In this work, we demonstrate quantitative capacitance and dielectric constant measurements of individual nanostructures using an Atomic Force Microscope (AFM). The new Heterodyne Scanning Capacitance Microscopy (H-SCM) method is based on frequency mixing of two alternating current (AC)-voltages with frequencies in the MHz range. This new method enables quantitative measurements of tip-sample capacitance and local dielectric permittivity with the lateral resolution of the AFM. We can show that the H-SCM reduces the effect of stray capacitance and thereby yields superior lateral resolution.
References:
[1] Fumagalli, L.; Ferrari, G.; Sampietro, M.; Gomila, G. Applied Physics Letters 2007, 91(24), 236243110. doi:10.1063/1.2821119