Regensburg 2022 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 70: Supported nanoclusters: Structure, Reactions, Catalysis

O 70.10: Vortrag

Donnerstag, 8. September 2022, 17:30–17:45, H6

Near-ambient pressure studies of size selected clusters on ultrathin silica films — •Matthias Krinninger, Florian Kraushofer, Friedrich Esch, and Barbara A.J. Lechner — Department of Chemistry, Technical University of Munich, 85748 Garching, Germany

Silicon oxide is a widely used catalyst support material for clusters and nanoparticles. Understanding the relationship between these clusters and the support is challenging, however, because SiO₂ is insulating, and in most applications not crystalline, which limits the use of diffraction-based experimental techniques. Some progress has been made by growing ultrathin, quasi-2D silica bilayer films on a variety of metal supports [1], which can then be measured by scanning tunneling microscopy (STM). Here, we show first results for ultrathin silica films grown on Pt(111) and their interaction with deposited metal clusters, examined by near-ambient pressure (NAP) XPS and NAP-STM. We investigate the stability of the films, their ability to stabilize small clusters without sintering, and the dependence of this stability on the crystallinity of the film.

[1] C. Büchner, M. Heyde, Two-dimensional silica opens new perspectives, Prog. Surf. Sci., 92 (2017) 341-374.