SKM 2023 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 35: Poster Session II
CPP 35.25: Poster
Mittwoch, 29. März 2023, 11:00–13:00, P1
Following the directed self-assembly of crystallizable block co oligmers via in situ AFM — •Alexander Meinhardt1, Peng Qi2, Ivan Maximov3, and Thomas F. Keller1 — 1Centre for X-ray and Nano Science (CXNS), Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany — 2Paul Scherrer Institut, Villigen, Switzerland — 3Solid State Physics and NanoLund, Lund University, Lund, Sweden
Bottom up nanofabrication utilizing the molecular self-assembly of block co-oligomers with sub-10 nm domain sizes is widely discussed as a promising route for next generation photolithography. Double crystalline co-oligomers can be used to create well defined, high-fidelity nanostructures by controlling the competing driving forces microphase separation and crystallization. We report on the surface nanostructure formation and the temporal evolution during annealing of thin films of an amphiphilic double crystalline polyethylene-block-poly(ethylene oxide) co-oligomer (PE-b-PEO) on planar and patterned surfaces. On a planar Si surface we observed the self-assembly of PE-b-PEO into locally ordered lamellar surface structures extending over several micrometers. Directed self-assembly (DSA) of this PE-b-PEO system by physical guiding patterns can enable the formation of large scale nano-templates interesting for future applications. First DSA experiments indicate that the formed PE-b-PEO based surface nanostructures depend on the pitch of the guiding pattern. We furthermore aim to use in situ AFM to shed light on the pitch-dependent structural evolution during dedicated temperature-controlled annealing procedures.