SKM 2023 –
wissenschaftliches Programm
CPP 44: Wetting, Fluidics and Liquids at Interfaces and Surfaces II (joint session CPP/DY)
Donnerstag, 30. März 2023, 09:30–13:00, MER 02
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09:30 |
CPP 44.1 |
Dynamic wetting of concentrated granular suspensions — •Reza Azizmalayeri, Peyman Rostami, and Günter K. Auernhammer
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09:45 |
CPP 44.2 |
Sliding drops: towards a universal law of friction — Xiaomei Li, Francisco Bodziony, Mariana Yin, Holger Marshall, Rüdiger Berger, and •Hans-Jürgen Butt
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10:00 |
CPP 44.3 |
Spreading of soft elasto-viscoplastic droplets — •Maziyar Jalaal, Cassio Oishi, and Hugo França
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10:15 |
CPP 44.4 |
Stick-slip Contact Line Dynamics in Forced Wetting of Polymer Brushes — •Daniel Greve, Simon Hartmann, and Uwe Thiele
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10:30 |
CPP 44.5 |
Demixing of liquid PDMS during dewetting into the equilibrium state — •Khalil Remini, Leonie Schmeller, Dirk Peschka, Barbara Wagner, and Ralf Seemann
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10:45 |
CPP 44.6 |
How droplets dry on stretched soft substrates — •Binyu Zhao, Yixuan Du, and Günter K. Auernhammer
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11:00 |
CPP 44.7 |
Gradient dynamics model for sessile drop evaporation in a gap: from simple to applied scenarios — •Simon Hartmann, Uwe Thiele, Christian Diddens, and Maziyar Jalaal
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11:15 |
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15 min. break
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11:30 |
CPP 44.8 |
Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing — •Max Huber, Xiao Hu, Andreas Zienert, and Jörg Schuster
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11:45 |
CPP 44.9 |
Electrokinetic, electrochemical and electrostatic surface potentials of the pristine water liquid-vapor interface — •Maximilian R Becker and Roland R Netz
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12:00 |
CPP 44.10 |
How Charges Separate at Moving Contact Lines — •Aaron D. Ratschow, Lisa S. Bauer, Pravash Bista, Stefan A. L. Weber, Hans-Jürgen Butt, and Steffen Hardt
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12:15 |
CPP 44.11 |
Beyond the plate capacitor: Calculating the full dielectric tensor for arbitrary system geometries — •David Egger, Christoph Scheurer, and Karsten Reuter
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12:30 |
CPP 44.12 |
Asymmetric Sessile Compound Drops — •Jan Diekmann and Uwe Thiele
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12:45 |
CPP 44.13 |
Steering droplets on substrates with plane-wave wettability patterns and deformations — •Josua Grawitter and Holger Stark
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