SKM 2023 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 12: Poster
DS 12.17: Poster
Mittwoch, 29. März 2023, 17:00–19:00, P3
Exfoliation of 2D materials for nanooptics — •Jakob Wetzel1, Maximilian Obst1,2, Susanne C. Kehr1,2, and Lukas M. Eng1,2 — 1TU Dresden, Dresden, Germany — 2Würzburg-Dresden Cluster of Excellence - EXC 2147 (ct.qmat), Dresden, Germany
The desire for smaller and more energy efficient optical components leads to the necessity of light confinement below the diffraction limit. This can be achieved e.g by phonon polaritons (PhPs) which are quasiparticles formed by the coupling of infrared photons with the optical phonons of a crystal. Particularly the related light confinement is enhanced when the PhPs are generated in anisotropic, 2D van der Waals materials such as MoO3 and GeS [1, 2]. Therefore, flat and µm - sized nanosheets of such materials are required, which can be realized by mechanical exfoliation.
Here, we present an optimized exfoliation technique for MoO3 and GeS resulting in the reproducible generation of 20 to 100 µm - sized flakes with a thickness of about 100 nm. We present a quick and easy to implement adaptation of the scotch-tape exfoliation technique as well as exemplary results based on optical microscopy images and atomic force microscopy.
[1] T.V.A.G de Oliveira et al., Adv. Mater. 33, 2005777 (2021).
[2] T. Nörenberg et al., ACS Nano, published online (2022),
DOI: 10.1021/acsnano.2c05376.