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SKM 2023 – scientific programme

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DS: Fachverband Dünne Schichten

DS 12: Poster

DS 12.4: Poster

Wednesday, March 29, 2023, 17:00–19:00, P3

Comparative evaluation of EDS quantification methods for the analysis of ScxAl1−xN films — •Hauke Honig1, Rebecca Petrich2, Lorenz Steinacker1, Younes Slimi2, Daniel Glöß3, Stephan Barth3, Hagen Bartzsch3, Raphael Kuhnen4, Dietmar Frühauf4, Stefan Krischok2, and Katja Tonisch21Technische Universität Ilmenau, Fachgebiet Werkstoffe der Elektrotechnik, IMN MacroNano®, 98693 Ilmenau — 2Technische Universität Ilmenau, Fachgebiet Technische Physik I, IMN MacroNano®, 98693 Ilmenau — 3Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP, 01277 Dresden, Germany — 4Endress+Hauser SE+Co. KG, TTD Technologieentwicklung, 79689 Maulburg, Germany

The quantitative analysis of ScxAl1−xN films with energy dispersive x-ray spectroscopy (EDS) poses some challenges due to peak overlaps and the thin film character. Standard-free and standard-based methods are compared regarding their reliability for the quantification of the Sc-content in sputtered films with 0 ≤ x ≤ 0.35 and evaluated using reference samples that have been quantified with GDOES and EDS by Fraunhofer FEP. Therefore, parameters such as acceleration voltage, selection of standard materials and quantification models are considered. Theoretical spectrums generated with Monte-Carlo simulations are used to improve the selection of excitation energy in the small range between substrate influence and limits of the quantification models. The crystalline hexagonal structure is confirmed with XRD.

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