SKM 2023 –
wissenschaftliches Programm
DS 16: Thermoelectric and Phase Change Materials; Layer Deposition
Donnerstag, 30. März 2023, 11:30–13:00, SCH A 315
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11:30 |
DS 16.1 |
A Multiscale Simulation Method for Deposition Processes: Micrometer-scale Off-Lattice Film Growth with Atomistic Precision — •Erik E. Lorenz and Jörg Schuster
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11:45 |
DS 16.2 |
Characterization and optimization of MgZnO thin films with steep lateral composition gradient — •Laurenz Thyen, Max Kneiß, Holger von Wenckstern, and Marius Grundmann
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12:00 |
DS 16.3 |
Physical properties of NixCu1-xI thin films deposited by magnetron co-sputtering — •Christiane Dethloff, Sofie Vogt, Daniel Splith, Holger von Wenckstern, and Marius Grundmann
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12:15 |
DS 16.4 |
Self-assembled droplet etching during semiconductor epitaxy for versatile quantum structures — •Christian Heyn, Ahmed Alshaikh, and Robert Blick
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12:30 |
DS 16.5 |
Interplay of Glass Dynamics and Crystallization Kinetics of Photonic Phase Change Materials Sb2S3 & Sb2Se3 — •Felix Hoff, Julian Pries, Maximilian J. Müller, Eric N. Lensker, and Matthias Wuttig
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12:45 |
DS 16.6 |
Seebeck coefficient inversion in highly doped organic semiconductors — •Morteza Shokrani, Kai Xu, Tero-Petri Ruoko, Dorothea Scheunemann, Hassan Abdalla, Hengda Sun, Chi-Yuan Yang, Yuttapoom Puttisong, Nagesh Kolhe, José Silvestre Mendoza Figueroa, Jonas Pedersen, Thomas Ederth, Weimin Chen, Magnus Berggren, Samson Jenekhe, Daniele Fazzi, Martijn Kemerink, and Simone Fabiano
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