SKM 2023 – scientific programme
Parts | Days | Selection | Search | Updates | Downloads | Help
HL: Fachverband Halbleiterphysik
HL 33: Poster II
HL 33.24: Poster
Wednesday, March 29, 2023, 17:00–19:00, P1
On the positioning accuracy of single quantum emitters in photonic nano-structures embedded through in-situ electron beam lithography — •Jan Donges, Johannes Schall, Imad Limame, Ching-Wen Shih, Sven Rodt, and Stephan Reitzenstein — Technische Universitaet Berlin, Hardenbergstr. 36, 10623 Berlin
The precise integration of single quantum emitters at the target position inside of photonic nano-structures is of upmost importance for their optimum performance. Differences between simulated photon extraction efficiencies and experimentally determined values are often at least partially contributed to a spatial misalignment of the emitter. This is a reasonable assumption considering that for instance in the case of Bullseye cavities simulations yield that the efficiency can drop more than 50% just in case of a 50nm misplacement between structure and emitter. The main problem with this approach so far has been that there is no direct way of determining the emitter position inside the structure. Therefore, all statements about the position were based indirectly on results of photoluminescence (PL) experiments. Here, we present a solution for this issue. Through the simultaneous measurement of the structure via cathodoluminescence and electron microscopy we can directly determine the emitter position inside a photonic structure with. Furthermore, this approach enables us to make a clear statement about the positioning accuracy of in-situ electron beam lithography.