SKM 2023 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
HL: Fachverband Halbleiterphysik
HL 7: Poster I
HL 7.3: Poster
Montag, 27. März 2023, 13:00–15:00, P2/EG
Atomic layer deposition of iron titanate for use as a photoanode — •Nina Miller1,2, Ryan Kisslinger1,2, and Ian Sharp1,2 — 1Walter Schottky Institut Technical University of Munich — 2Physics Department, TUM School of Natural Sciences, Technical University of Munich, Garching, Germany
TiO2 is of significant importance in the field of energy research. However, to develop it for artificial photosynthesis, the band gap of TiO2, which is 3.2 eV and consequently absorbs only ultraviolet light, must be paired with a material capable of absorbing visible light. Here, we experimentally explore the effect of depositing thin films of hematite (α - Fe2O3) on nanostructured TiO2 using atomic layer deposition, with a further high-temperature annealing step to produce visible-light absorbing iron titanate (Fe2TiO5). Iron titanate may allow enhance charge transfer at the photoanode surface, and serve as a visible light absorbing layer. Furthermore, the TiO2 nanotube arrays used as the substrate during atomic layer deposition can orthogonalize light absorption with respect to charge separation, leading to enhanced photocatalytic conversion during solar water splitting.