SKM 2023 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

MA: Fachverband Magnetismus

MA 40: Poster Magnetism II

MA 40.54: Poster

Donnerstag, 30. März 2023, 14:00–16:00, P2/EG

Optimised mechanical exfoliation of antiferromagnetic MnPS₃ — •Niklas Leuth — II. Institute of Physics B, RWTH Aachen University, Aachen, Germany

An optimized mechanical exfoliation technique was developed to exfoliate large-area few-layer flakes of the antiferromagnetic van-der-Waals material MnPS₃. This was achieved by utilizing the process of oxygen plasma ashing on gold surfaces and making use of the good bonding strength between the gold surface and the sulfur atoms which terminate the individual layers of MnPS₃. Furthermore, there is evidence that the gold surface of the substrate gets oxidised by the oxygen plasma. With the optimised technique, it was possible to exfoliate ∼ 100  µm²-large mono- and bilayer flakes. Furthermore, a method was developed which characterises the layer thickness of the exfoliated flakes quantitatively based on the optical Michelson contrast.