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O: Fachverband Oberflächenphysik
O 13: Focus Session: Ion Beam Interaction with Surfaces and 2D Materials II
O 13.6: Talk
Monday, March 27, 2023, 16:30–16:45, GER 38
Compact Electron Beam Ion Source — •Daniel Thima1, Matthias Werl1, Gabriel Lukas Szabo1, Paul-Friedmar Laux2, Mike Schmidt2, Günter Zschornack2, and Richard Arthur Wilhelm1 — 1TU Wien, Institute of Applied Physics, Vienna, Austria — 2D.I.S Germany GmbH, Dresden, Germany
In many modern fields of research, such as plasma and atomic physics, material science or astrophysics, highly charged ions play an important role. Research with highly charged ions relies strongly on stable ion sources, providing long-term operation with the low output currents in standard devices. Typically, these devices are heavy, stationary machines such as electron cyclotron resonance ion sources or electron beam ion sources (EBIS), sometimes even relying on cryogenic magnetic systems.
Gaining portability by downsizing an EBIS has been pursued recently by a commercial supplier. With only 30 cm in length and using in-vacuum mounted magnets, the resulting prototype EBIS fits onto almost any ultra high vacuum chamber, needing only a single CF40 port. An included Wien filter allows separation of produced ions based on their charge state and mass.
We are currently characterising this compact EBIS in our laboratory, focusing on ion output current. Here, we present our setup and the results of first measurements.