SKM 2023 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 18: Poster: 2D Materials I
O 18.8: Poster
Montag, 27. März 2023, 18:00–20:00, P2/EG
Tuning the electronic structure of MoS2: how self-intercalation affects screening, interactions and strain — •Borna Pielic1,2, Matko Muzevic3, Dino Novko2, Jiaqi Cai1, Alice Bremerich1, Robin Ohmann1, Marko Kralj2, Iva Srut Rakic2, and Carsten Busse1 — 1Department Physik, Universitat Siegen, Siegen, Germany — 2Institute of Physics, Zagreb, Croatia — 3Department of Physics, Josip Juraj Strossmayer University of Osijek, Osijek, Croatia
Growth of quasi-freestanding 2D materials on van der Waals (vdW) typed substrates can be accompanied by intercalation in order to modify their intrinsic properties. In this work, we epitaxially grow MoS2 monolayer islands on graphene on Ir(111) using two different procedures: (i) two-step molecular beam epitaxy (MBE) growth which results in S intercalation between graphene and Ir(111), and (ii) single-step MBE growth resulting in Mo intercalation. Scanning tunneling microscopy (STM) measurements reveal significant difference in MoS2 islands morphology, and suggests that S intercalation weakens the interaction in the MoS2/graphene stack, while Mo intercalation strengthens it. More importantly, our scanning tunneling spectroscopy (STS) measurements show notable non-rigid shifts of electronic states. The numerical calculations reveal a strong correlation between substrate screening, strain and binding energy, that are in line with experiment. We suggest that this elegant and non-invasive technique could in general be used for altering vdW, electron-electron and electron-phonon interactions in 2D materials.